配色: 字号:
High_Temperature_Durability_Amorphous_ITOYb_Films_.pdf
2021-03-13 | 阅:  转:  |  分享 
  
????
TaeDongJung/45(2012)242-247247
Fig.7.TransmittanceofITOandITO:YbfilmsdepositedwiththevariousRFpowersat(a)roomtemperatureand(b)
o
post-annealedat170C.
transmittance>80%inthevisiblelightregion(550ofMKE/KEIT[10039263,Developmentofwindow-
nm),eventhoughtransmittanceofITOfilmsslightlyunified30in.touchsensor].Thisworkwaspartially
decreasedwithincreasingYbcontent.supportedbythehumanresourcesdevelopmentof
theKoreaInstituteofEnergyTechnologyEvaluation
andPlanning(KETEP)grantfundedbytheKorea
4.Conclusions
government,MinistryofKnowledgeEconomy(No.
ITOandITO:Ybfilmsweredepositedonunheated20104010100540)andinpartbyKoreaInstituteof
non-alkaliglasssubstratesbymagnetronco-sputteringMaterialsScience(KIMS).
atvariousRFpowerssuppliedtotheYbOtarget
23
o
andpost-annealedatdifferenttemperatures(170C,
References
o
200C).TheXRDresultsrevealedthattheITOfilm
1.Y.H.Jung,E.S.Lee,K.H.Kim,J.Kor.Inst.
waspolycrystallinestructurebuttheITO:Ybfilm
Surf.Eng.,38(2005)150.
wasamorphousstructureafterpost-annealedat
o
2.Z.C.Jin,I.Harmberg,C.G.Granqvist,ThinSolid
170C,whichwasattributedtobothlargerionic
3+
Films,64(1988)381.
radiusofYbandhigherbondenthalpyofYbO,
23
3.P.K.Song,Y.Shigesato,I.Yasui,D.C.Paine,
comparedtoITO.However,apolycrystallinestructure
o
Jpn.J.Appl.Phys.,37(1998)1870.
wasobservedinallfilmspost-annealedat200C.
4.J.E.A.vandenMeerakker,P.C.Baarslag,W.
TheetchingrateoftheITO:Ybfilmsincreasedwith
Walrave,T.J.Vink,ThinSolidFilms,266(1995)
increasingYbcontent.TheresistivityoftheITOand
152.
ITO:YbfilmsdecreasedwithincreasingT,whichis
a
5.E.Nishimura,M.Ando,K.Onisawa,Jpn.J.Appl.
duetotheincreaseofcarrierdensity.Theamorphous
Phys.,35(1996)2788.
o
ITO:Ybfilmspost-annealedat170Cshowedresistivity
6.D.C.Paine,T.Whitson,D.Janiac,Jpn.J.Appl.
?4
of5.52×10cm.Ontheotherhand,thelowest
Phy.,85(1999)8445.
?4
resistivityofITO(2.49×10cm)andITO:Yb
7.P.K.Song,H.Akao,M.Kamei,Y.Shigesato,Jpn.
?4
(2.62×10cm)wasobtainedforthepolycrystalline
J.Appl.Phys.,38(1999)5224.
o
filmspost-annealedat200C.Theresistivityofthe
8.S.I.Kim,S.H.Cho,P.K.Song,J.Kor.Phys.
ITO:YbfilmsincreasedwithincreasingYbcontent,
Soc.,54(2009)1297.
indicatingthattheimpurityYbatomsdidnotcontribute
9.Y.M.Kang,S.H.Kwon,J.H.Choi,Y.J.Cho,
tocarriergeneration.However,itisconfirmedthat
P.K.Song,ThinSolidFilms,518(2010)3081.
theintroductionofYbatomsimprovedremarkably
10.D.Y.Lee,J.R.Lee,P.K.Song,Surf.Coat.
thesurfacemorphology,etchingrateandpatterning
Technol.,202(2008)5718.
propertyoftheITOfilm.11.T.S.Kim,C.H.Choi,T.S.JeongandK.H.
Shim,J.Kor.Phys.Soc.,51(2004)534.
12.C.Guillen,J.Herrero,Vacuum,80(2006)615.
Acknowledgments
13.Y.Shigesato,D.C.Paine,Appl.Phys.Lett.,62
(1993)1268.
ThisresearchwassupportedbytheR&Dproject
ViewpublicationstatsViewpublicationstats
???????
献花(0)
+1
(本文系新用户1440l...首藏)